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The Release of the Jr25 True Portable Profilometer

Nov, 2010 (Irvine, CA) – The Nanovea Jr25, 3D Non Contact Portable Profilometer, is the first truly portable high performance Profilometer of its kind. With an optional battery pack and carrying case, the Jr25 provides measurement capability rarely available during field study. The Jr25 is designed to easily utilize leading edge optical pens using superior white light axial chromatism measurement. Nano through macro range can be obtained during measurement (Profile/Dimension, Roughness/Finish/Texture, Shape/Form/Topography, Flatness/Warpage, Volume Area, Step-Height/Depth/Thickness and others) on a wider range of geometries and materials than any other Profilometer and now with true portable capability. With a total weight less than 5.5 Kg, the operator can safely place the Jr25 onto the surface under inspection. The Jr25 has the ability to measure an area up to 25mm x 25mm, and depending on the optical pen a depth up to 27mm and resolution down to 5nm. Focusing of the surface is achieved manually with a smooth touch micrometer and 30 mm travel range. Surfaces of almost any type can be measured regardless of how reflective/no reflective, transparent/opaque, or specular/diffusive the material is. With a fully rotational, single axis, head the Jr25 has the ability to measure surfaces at difficult angles. Along with quick and ease of use, the Jr25 has been designed specifically for production environments where samples cannot be moved and open field studies. “The door has now been opened for our 3D Non Contact technique to reach environments untouched by this type of measurement ability; from the moon to the desert and everything in between. The field has truly become the lab with this type of measurement resource at your side.” – Craig Leising | Product Manager

US Nanotechnology Instrument Manufacturer Proves the Success of R&D Stimulus

Irvine CA, Jan 25, 2010 – Like many throughout the country, you may be asking how the billions poured into science R&D has helped stimulate our economy. Well, look no further than the nanotechnology instrument manufacture, Nanovea based in Irvine, CA. 2009 just ended as their first branded year with new hires, new instruments and more business to send to their local machine shops and parts suppliers. From their Irvine, CA office Nanovea designs and manufactures 3D Profilometers, Mechanical Testers & Tribometers to combine the most advanced testing capabilities in the industry:Scratch, Adhesion, Hardness, Wear, Friction & 3D Non-Contact Metrology at Nano, Micro & Macro range. Unlike other manufactures Nanovea also provides Laboratory Services, offering clients availability to the latest technology and optimal results through improvements in material testing standards. So what does Nanovea have to do with the stimulus given to research in the United States? Well coincidently, everything and here’s how. The stimulus given to research labs, universities and companies was intended for the development of new innovations and materials to support growing industries such as solar, energy, biomedical etc. To create new, and or improve, material requires new instruments to measure and insure material characteristics during research and development. Then, instrumentation would also be needed to monitor the mass development of these new materials for quality control. Nanovea had been designing and manufacturing instruments for this very purpose since 2004 and had been preparing for a brand launch at the end of 2008. With the direction of a newly hired marketing manager Nanovea prepared its launch in one of the most challenging economic times the US may have ever faced. Nanovea embraced the challenge and took full advantage of the needs of the research community both in the US and Internationally. With three clear product lines and services Nanovea provided solutions throughout 2009 to high growth industries in need of nano through macro scale measurement needs. Now 2010 has already begun with several new projects throughout the world and with local solar, pharmaceutical and medical clients throughout California. “Being a US manufacturer of nano instruments and services during this time has provided us with some great opportunities to establish our brand. We are very thankful and also very proud that were able to support the economy with new hires and business to our local partners.” —Pierre Leroux, Nanovea President | Ceo

Nanometer Online Inspection With Nanovea 3D Non-Contact Profilometer

Irvine CA, Jan 05, 2010 – Nanovea 3D Non-Contact Profilometer will now have optional online capability for automated inspection and report generation. With this advancement Nanovea’s Profilometer can now effortlessly integrate into large or small quality control environments. Crucial applications throughout all industries, which were once inspected with vision and or touch-probe, will now be inspected with the assurance of high speed noncontact nanometer measurement. This is especially critical to batch production with tight tolerance levels which can now be easily monitored to insure quality control via online communication. With this new feature applications can be automatically scanned and analyzed based on instructions found on a server database. The online inspection feature allows automatic product ID scan with a bar code reader (could also be manually entered in); the product ID is then checked against predefined pass/fail and measurement requirements stored on a company database. The part is automatically measured, and upon completion a report is automatically generated. The report and the pass/fail information is automatically sent back to the server and stored with that part number. Measurement speeds range from 1m/s and 31,000 points/sec with nanometer accuracies. There are various scan types, analysis functions and size options that can be customized to fit applications throughout all industries. “This is a very exciting capability for Nanovea. Our Profilometers can best utilize online inspection at this time, but it is also a new option for our Mechanical Testers when hardness could be used for quality control.”
Craig Leising, Product Manager

Breakthrough Nanoindentation Testing With Image Pattern Recognition

Irvine CA, April 1, 2009 – Nanovea announced today a breakthrough development in Nanoindentation testing by combining advanced image pattern recognition capabilities to the most advanced nano-indenter for quality control applications. Nanovea has now combined their, PRVision, machine vision camera option to Nanoindentation testing that allows auto-recognition of precisely chosen features with little to no user interaction. The user-friendly software of Nanovea’s PRVision allows for an automatic test of hardness and elastic modulus on patterned samples or specifically chosen areas of interest. Nanoindentation properties including hardness and elastic modulus can then be automatically measured and recorded. The “quasi non-destructive” low loads associated with Nanoindentation Testing makes this technique an ideal breakthrough tool to monitor the quality control of environments where hardness and elastic modulus are crucial: Micro Electronics, Solar, Pharmaceuticals and many others. “Nanoindentation until now was performed using primitive mapping options. Our PRVision option will speed up Nanoindentation testing and opens the door to wide-scale automatic production quality control applications where hardness and elastic modulus are the best control parameters.” Said Pierre Leroux, CEO/President, Nanovea.

Top Semiconductor Mfg Chooses Nanovea Profilometer Over Many

Irvine CA, March 5, 2009 – Nanovea announced today that it will ship a top Semiconductor Mfg its first HS1000 Profilometer. The HS1000 delivery adds yet another highlight to Nanovea’s impressive Optical Profiler history and offers customers a more advanced measurement speed option for high throughput demands. The HS1000 Profilometer is equipped with an unmatched combination of measurement speed, automation and nanometer resolution.Until the Nanovea HS1000 Profilometer, full automation and the unique advantages of white-light axial chromatism technique were features rarely found in a single high scanning speed instrument; a feature the Client requested and only Nanovea could deliver. Traditional high speed instruments would typically sacrifice one feature for another, speed or resolution, which limited the users overall measurement capability. The HS1000 Profilometer stage speed can reach 1m/s, up to 50 times faster than most optical profilers in its class. The HS1000 Profilometer is equipped with a 31KHz white-light axial chromatism sensor and XY measurement area of 400mm x 600mm, which at maximum stage speed can measure 1 point every 32µm and traverse the full 400mm in less than 1 sec. (higher resolution can be obtained with proportionally slower stage speeds). In addition, the HS1000 Profilometer has a machine vision camera option that allows auto-recognition on precisely chosen surface features with little to no user interaction. The user-friendly software and the optional machine vision camera allows for an automatic scan of the surface to recognize all features of interest. These features can then be automatically measured or the user can select from a list from which to measure. The combination of superior overall features makes the HS1000 Profilometer unquestionably the instrument of choice for high throughput demands found in Semiconductor, Solar and Pharmaceutical industries. “It goes without saying the importance of gaining this client’s choice. I’m proud of our team’s ability to deliver with such an important opportunity,” Said Craig Leising, Product Manager, Nanovea.

Nanovea Profilometer Receives “Class 1”Cleanroom Approval

Irvine, CA, January 22, 2009 — Nanovea Inc. announced today the successful installation of their Profilometer within the Class 1 Cleanroom of a leading micro-electronics manufacturer. Class 1 Cleanroom clearance is known for its strict compliance and custom demand for all materials used in the development of the instrument. The advanced 3D non-contact profiling abilities of Nanovea’s Profilometers will now be an option for the strictest microelectronic cleanroom requirements. With the use of “clean” motorized linear stages and the proper selection of materials, Nanovea’s engineers custom designed a system that would be compatible with the strict class 1 standards. Class 1 Cleanrooms have a tightly controlled level of contamination and allows for very few particles of any kind. The material selection was crucial in the design of the X-Y stages so that few particles are emitted into the air during testing. The system was also designed with a high degree of flatness, accuracy and with a level of automation that allows the user to measure multiple areas and stitch them together. This will allow the user to create one large, planar surface in order to compare relative flatness with very little user interaction. The measureable area of the custom profiler can be as large as 30cm x 30cm with vertical resolution down to 2nm. A design is also available to scan large, heavy and even immoveable parts. This is only a glimpse at the projects Nanovea’s engineers have customized. They have also provided a custom built high-speed Profilometer with speeds over 30,000 points/second and machine vision with image recognition to improve efficiency. Additionally, Profilometer have been built with custom scanning capabilities to acquire surface measurements from both the top and bottom surfaces while measuring the thickness of the material, all with nanometer resolution. “The addition of the cleanroom design will allow Nanovea to work closer with strict environments, and once again shows our dedication to ingenuity.” Said Craig Leising, Product Manager Nanovea, Inc.

Profilometer Brakes New Ground Break New Ground

Irvine CA, December 02, 2008 — Nanovea announced today that it’s non contact profiler line-up will now include a system with measurement speeds over 180 times faster. With this new advancement Nanovea’s Profilometerwill now have the capability to reach speeds suitable for more time constraint production and quality control environments. This new advancement in Profilometer Technology is a breakthrough for use within these particular environments. Prior to this new advancement this profiling technique had required a point-by-point measurement, which acquired single data points while the sample being measured moved back-and-forth under the optics to create 3D mapping. With this new technology there will be line of 180 measureable points that will be acquired simultaneously, which will significantly decrease the time to create a 3D mapping of the surface. “I’m excited about this new capability; this will give us the ability to work with new markets that require high throughputs.” Said Craig Leising, Product Manager, Nanovea. The new Profilometer System uses 1 x 180 array of measurement points and can scan up to 1800 lines per second to create and overall scan rate of up to 324,000 points per second. The system will be capable of measuring large areas in seconds with high resolution and can be equipped with image recognition software for high speed inspection. Options will also include a scanning mirror to create a field scanning function that will measure 180 points by 230 lines. Custom inline system will also be available.

Nanovea’s Patent Pending Non-Contact Optical Depth Sensing Technique

Irvine CA, October 20, 2008 — Nanovea has Patent Pending on Non-Contact Optical Depth Sensing for Instrumented Indentation and Scratch Testing. The “Revolutionary” non-contact technique delivers 100% accurate height measurements during micro/macro scratch and hardness testing. Prior to this new advancement any testing would require mechanical surface contact, which was impossible during sample movement, to take in account substrate and machine compliance. Now with the ability to observe the precise depth of the indenter without touch, sample motion is no longer an issue and true depth of the indenter can be directly recorded. “We are very excited about our new technique and look forward to showcasing its superior results,” Said Pierre Leroux, General Manager, Micro Photonics Surface Test Division. “We are consistently looking for new ways to provide instruments that are as progressive as the solutions their intended for; I think this technique does just that. “The high precision modules for the determination of the Micro/Macro mechanical properties of thin/thick coatings and substrates using instrumented indentation and scratch/adhesion testing. They are ideal for the characterization of industrial coatings; ranging from plasma processed layers, used in semiconductor and optical technology, to decorative and protective coatings, used for automobile parts and consumer goods. Nanovea Micro/Macro Mechanical Testers use independent force and depth sensors to obtain depth-versus-load curves used in instrumented indentation and scratch testing. The result, the fastest and most accurate measuring technique in the industry and capable on any shape & texture of material and resolves challenges associated with the older methods for indenter height measurements such as sinking on soft materials and reference movement on rough surfaces.

Formula Drift Racing Using Material Testing Instruments

Irvine, California – August 2, 2007 – Micro Photonics, announced today the company was named “Official Material Testing Equipment Supplier” for the Formula Drift Professional Racing Series.The sponsorship teams Micro Photonics, a leading provider of instrumentation for material testing and analysis, with Formula Drift Holdings, LLC; the only professional drift racing series in North America. Under the agreement Micro Photonics agrees to provide Formula Drift with instrumentation, and in exchange, Formula Drift grants Micro Photonics all accompanying sponsorship rights and privileges.“Micro Photonics is looking forward to a great relationship with the Formula Drift Professional Racing Series.” Said Pierre Leroux, General Manager, Micro Photonics Surface Test Division. “Since we offer such a diverse selection of instruments, we can provide everything drivers need for equipment verification and quality control. Plus, it’s exciting to be involved with Drift Racing, the interest is tremendous.”Drift racing a highly skilled motor sport that requires drivers to out maneuver their competition by finessing their cars with power slides around a series of corners on a set course, pushing the car’s tire traction to the limits. “Every drift racer on the planet needs a tire durometer!” said Randy Hembrey, Chief Steward Formula Drift Professional Racing Series. The handheld instruments will be used during races to verify tire hardness, critical to race performance.In addition to instrumentation, drivers and staff will benefit from Micro Photonics’ mechanical engineering experience. The alliance also provides an opportunity to build relationships with other Formula Drift Sponsor organizations. Micro Photonics has been a leading provider of material testing instruments and laboratory testing for more than fifteen years. The company specializes in: Nano and Micro Mechanical Testing, X-Ray Micro Tomography, X-Ray Diffraction, 3D Non-Contact Profilometer, Thin Film Analysis, Biological Imaging Instruments and NSOM, SPM & AFM systems.

New Multipen Turret From Micro Photonics Offers Nine Sensor Options in One Assembly

Irvine CA, July 7, 2006 – Micro Photonics Inc. today, introduced the new multi optical pen turret offering greater flexibility in chromatic confocal measurements. Incorporating the multi optical pen turret onto the Profilometer allows users to quickly and easily change optical pens without spending down time removing or adding new pen assemblies. Comprised of three unique magnifiers and three different chromatic lenses, the multi optical pen Turret offers up to nine optical sensor options in a single assembly. The turret easily integrates onto any new or existing Nanovea Profilometer 3D Optical Non-Contact Optical Profiler. Pen combinations are comprised from over thirty different sensor selections available from Micro Photonics. Choices include five magnifiers, ranging from 3.3 mm to 29 mm focal lengths, and six different chromatic lenses, 130 µm to 27 mm depth of fields. Pen combinations can achieve maximum axial resolution of 5 nm, accuracy to 20 nm and max slope to 87º for diffusive objects. This Nanovea Micromeasure option is available exclusively from Micro Photonics Inc. Micro Photonics has been a leading provider of materials technology instruments and laboratory testing since 1992. The company specializes in: Nano and Micro Mechanical Testing, X-Ray Micro Tomography, Ellipsometery, X-Ray Diffraction, 3D Non-Contact Profilometer, Thin Film Analysis, Biological Imaging Instruments and NSOM, SPM & AFM systems.

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