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Chromatic Confocal Technology

Profilometry - Chromatic Confocal Sensor Technology
Best for steep angles
No Image Stitching
Fast for large areas
No Sample Prep
Very easy to use
No Refocusing

Chromatic Confocal Technology, used in NANOVEA profilometers, operates via a process that utilizes white light and a series of sphero-chromatic lenses. The sphero-chromatic lenses split the white light into individual wavelengths with unique vertical focal points (vertical distance from surface or height). All wavelengths and their corresponding heights make up the height range measurement scale of a sensor.

The wavelength with the highest intensity will be detected by the spectrometer which processes the wavelength’s associated height. During a full raster scan, this process takes a fraction of a second and produces an accurate height map of the surface of interest.

NO COMPLEX ALGORITHMS        NO LEVELING REQUIRED

NO X-Y DATA STITCHING

The Problem with Other Techniques

(Interferometry, Laser Microscope, Focus-Variation)

Lateral Resolution vs Lateral Accuracy

Camera Pixel Size or Display Resolution is often defined as lateral resolution to impress clients.

Instruments that use camera pixel-based technology require complex algorithms to determine the focal point of the instrument which is problematic for complex surfaces.

NANOVEA’s Chromatic Confocal Technology on the other hand provides lateral accuracy which is determined by physics and is directly related to the spot size of the chromatic light source of the optical sensor.

OTHERS

NANOVEA

LASER SCANNING CONFOCAL MICROSCOPE

VS

CHROMATIC LIGHT OPTICAL SENSOR

Health Hazard

Exposure to laser light reflectivity

Safe White Light

No need for protective wear

INCONSISTENT LASER LIGHT WAVELENGTH

Inconsistencies in wavelength during scanning affect accuracy of results

UNIFORM & BROAD WHITE LIGHT SPECTRUM

Changes in wavelength are the data being collected

DECEPTIVE ‘DISPLAY RESOLUTION’

Lateral & height accuracy are fixed by the objective lens making ‘Display Resolution’ insignificant

INDEPENDENT LATERAL & HEIGHT ACCURACY

Lateral & height accuracy can be mixed and matched to meet a broad range of scanning requirements

COMPLEX ALGORITHMS

Alpha blending algorithms stitch collected data layer by layer, grounding accuracy on complex calculations

NO ALGORITHMS

Physical wavelength reflected from the surface is measured directly for an accurate representative height map

STITCHING REQUIRED

Objective lenses have limited fixed fields of view. Stitching of larger areas compromises accuracy of the scan

NO STITCHING

Data points are collected continuously providing the same level of accuracy for both small and large areas

50x SLOWER

Data acquisition speed up to 7.9 KHz

50x FASTER

Data acquisition speed up to 384 KHz

Let’s Scan A Coin

Lateral Accuracy

OTHERS

NANOVEA

50x OBJECTIVE

VS

HIGH SPEED SENSOR (950 μm)

For 50x objective (370 x 277 µm)

±2% of measuring value

±2% x 370 µm

≈ 15 µm

with stitching algorithms >> 15 µm

Step size:

≈ 5 µm

ULTIMATE LIMIT: 0.9 µm

3x BETTER LATERAL ACCURACY

Height Accuracy

OTHERS

NANOVEA

50x OBJECTIVE

VS

HIGH SPEED SENSOR (950 μm)

≈ 0.2 + L/100 µm

≈ 0.2 + 950/100 µm

9.7 µm

950 µm range

≈ 0.6 µm

ULTIMATE LIMIT: 0.014 µm

16x BETTER HEIGHT ACCURACY

Area Tested

OTHERS

NANOVEA

50x OBJECTIVE

VS

HIGH SPEED SENSOR (950 μm)

Stitching Required

# scans (25 x 25 mm)

25 000 µm / 370 µm x 25 000 µm / 277 µm

68 x 91

= 6188 scans

No Stitching

Consistent accuracy across any measurement size

1 SCAN

Test Time

OTHERS

NANOVEA

50x OBJECTIVE

VS

HIGH SPEED SENSOR (950 μm)

6 sec per scan

+ 4 sec displacement & stitching

= 10 sec/scan x 6188 scans

= 61880 seconds (≈ 17 hours)

Scan time (25 x 25 mm)

= 29.6 seconds

2090x FASTER

EXPERIENCE THE FUTURE OF PROFILOMETRY

Portable

Compact

Portable

High Speed

Modular

Standard

Modular

Large area

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ARE ALWAYS

ONE CLICK AWAY

Portable high speed profilometer JR100