{"id":3355,"date":"2018-03-29T13:50:56","date_gmt":"2018-03-29T13:50:56","guid":{"rendered":"https:\/\/nanovea.com\/?p=3355"},"modified":"2021-06-22T22:02:31","modified_gmt":"2021-06-22T22:02:31","slug":"propriedades-mecanicas-de-revestimento-de-bolachas-de-silicio-carboneto","status":"publish","type":"post","link":"https:\/\/nanovea.com\/pt\/mechanical-properties-of-silicon-carbide-wafer-coatings\/","title":{"rendered":"Propriedades mec\u00e2nicas dos revestimentos de pastilhas de carboneto de sil\u00edcio"},"content":{"rendered":"<p>A compreens\u00e3o das propriedades mec\u00e2nicas dos revestimentos de wafer de carboneto de sil\u00edcio \u00e9 fundamental. O processo de fabrica\u00e7\u00e3o de dispositivos microeletr\u00f4nicos pode ter mais de 300 etapas de processamento diferentes e pode levar de seis a oito semanas. Durante este processo, o substrato do wafer deve ser capaz de suportar as condi\u00e7\u00f5es extremas de fabrica\u00e7\u00e3o, uma vez que uma falha em qualquer etapa resultaria na perda de tempo e dinheiro. Os testes de <a href=\"https:\/\/nanovea.com\/micro-indentation-tester\/\">dureza<\/a>A resist\u00eancia \u00e0 ader\u00eancia\/risco e a taxa de COF\/desgaste do wafer devem atender a certos requisitos para sobreviver \u00e0s condi\u00e7\u00f5es impostas durante o processo de fabrica\u00e7\u00e3o e aplica\u00e7\u00e3o para assegurar que uma falha n\u00e3o ocorrer\u00e1.<\/p>\n<p><a href=\"http:\/\/nanovea.com\/App-Notes\/NanoindentationofWafer.pdf\">Propriedades mec\u00e2nicas dos revestimentos de pastilhas de carboneto de sil\u00edcio<\/a><\/p>","protected":false},"excerpt":{"rendered":"<p>Understanding the mechanical properties of silicon carbide wafer coatings is critical. The fabrication process for microelectronic devices can have over 300 different processing steps and can take anywhere from six to eight weeks. During this process, the wafer substrate must be able to withstand the extreme conditions of manufacturing, since a failure at any step [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":3359,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_exactmetrics_skip_tracking":false,"_exactmetrics_sitenote_active":false,"_exactmetrics_sitenote_note":"","_exactmetrics_sitenote_category":0,"footnotes":""},"categories":[7,348,338,349,337,355,335,345,346],"tags":[307],"class_list":["post-3355","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-application-notes","category-friction-testing-coefficient-of-friction","category-indentation-hardness-elastic","category-laboratory-testing","category-mechanical-testing","category-profilometry-volume-area","category-profilometry-testing","category-scratch-testing-adhesive-failure","category-scratch-testing-cohesive-failure","tag-properties-of-silicon"],"_links":{"self":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts\/3355","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/comments?post=3355"}],"version-history":[{"count":1,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts\/3355\/revisions"}],"predecessor-version":[{"id":3356,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts\/3355\/revisions\/3356"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/media\/3359"}],"wp:attachment":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/media?parent=3355"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/categories?post=3355"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/tags?post=3355"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}