{"id":1240,"date":"2012-01-08T00:23:49","date_gmt":"2012-01-08T00:23:49","guid":{"rendered":"http:\/\/nanovea.com\/?p=1240"},"modified":"2015-06-18T16:29:28","modified_gmt":"2015-06-18T16:29:28","slug":"teste-de-microestrutura-resistencia-com-nano-arranhoes","status":"publish","type":"post","link":"https:\/\/nanovea.com\/pt\/teste-de-microestrutura-resistencia-com-nano-arranhoes\/","title":{"rendered":"Resist\u00eancia a arranh\u00f5es da microestrutura usando o teste de arranh\u00f5es"},"content":{"rendered":"<p>Nesta aplica\u00e7\u00e3o, o Testador Mec\u00e2nico Nanovea em sua nano <a title=\"teste de arranh\u00f5es\" href=\"https:\/\/nanovea.com\/nano-scratch-tester\" target=\"_blank\">teste de arranh\u00f5es<\/a> O modo \u00e9 usado para medir a carga necess\u00e1ria para causar falha em uma microestrutura. Devemos simular o processo de raspagem de forma controlada e monitorada para observar a resist\u00eancia aos arranh\u00f5es. Um estilete com ponta diamantada 10\u03bcm \u00e9 usado com uma carga progressiva que varia de 10 mN a 20 mN para riscar a microestrutura. O ponto em que o revestimento falha por rachadura \u00e9 tomado como o ponto de falha.<\/p>\n<p><a href=\"https:\/\/nanovea.com\/wp-content\/themes\/wp-nanovea\/Application%20Notes\/microstructure-resistance.pdf\">Resist\u00eancia aos arranh\u00f5es<\/a><a href=\"https:\/\/nanovea.com\/wp-content\/themes\/wp-nanovea\/Application%20Notes\/microstructure-resistance.pdf\"> de Microestrutura usando Teste de Raspadinha<\/a><\/p>","protected":false},"excerpt":{"rendered":"<p>In this application, the Nanovea Mechanical Tester in its nano scratch testing mode is used to measure the load required to cause failure to a microstructure. We must simulate the process of scratching in a controlled and monitored manner to observe scratch resistance. A 10\u03bcm diamond tipped stylus is used at a progressive load ranging [&hellip;]<\/p>","protected":false},"author":1,"featured_media":1241,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_exactmetrics_skip_tracking":false,"_exactmetrics_sitenote_active":false,"_exactmetrics_sitenote_note":"","_exactmetrics_sitenote_category":0,"footnotes":""},"categories":[7],"tags":[182],"class_list":["post-1240","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-application-notes","tag-scratch-resistance"],"_links":{"self":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts\/1240","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/comments?post=1240"}],"version-history":[{"count":3,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts\/1240\/revisions"}],"predecessor-version":[{"id":1799,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/posts\/1240\/revisions\/1799"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/media\/1241"}],"wp:attachment":[{"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/media?parent=1240"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/categories?post=1240"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/nanovea.com\/pt\/wp-json\/wp\/v2\/tags?post=1240"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}