{"id":1240,"date":"2012-01-08T00:23:49","date_gmt":"2012-01-08T00:23:49","guid":{"rendered":"http:\/\/nanovea.com\/?p=1240"},"modified":"2015-06-18T16:29:28","modified_gmt":"2015-06-18T16:29:28","slug":"odpornosc-mikrostruktury-z-testowaniem-nano-zarysowan","status":"publish","type":"post","link":"https:\/\/nanovea.com\/pl\/microstructure-resistance-with-nano-scratch-testing\/","title":{"rendered":"Odporno\u015b\u0107 na zarysowania mikrostruktury przy u\u017cyciu testu zarysowa\u0144"},"content":{"rendered":"<p>W tym zastosowaniu, tester mechaniczny Nanovea w swojej nano <a title=\"testowanie zarysowa\u0144\" href=\"https:\/\/nanovea.com\/nano-scratch-tester\" target=\"_blank\">testowanie zarysowa\u0144<\/a> s\u0142u\u017cy do pomiaru obci\u0105\u017cenia wymaganego do spowodowania uszkodzenia mikrostruktury. Musimy symulowa\u0107 proces zarysowania w kontrolowany i monitorowany spos\u00f3b, aby obserwowa\u0107 odporno\u015b\u0107 na zarysowanie. Rysik z ko\u0144c\u00f3wk\u0105 diamentow\u0105 o \u015brednicy 10 \u03bcm jest u\u017cywany przy progresywnym obci\u0105\u017ceniu w zakresie od 10 mN do 20 mN do zarysowania mikrostruktury. Punkt, w kt\u00f3rym pow\u0142oka ulega zniszczeniu w wyniku p\u0119kni\u0119cia, jest traktowany jako punkt zniszczenia.<\/p>\n<p><a href=\"https:\/\/nanovea.com\/wp-content\/themes\/wp-nanovea\/Application%20Notes\/microstructure-resistance.pdf\">Odporno\u015b\u0107 na zarysowania<\/a><a href=\"https:\/\/nanovea.com\/wp-content\/themes\/wp-nanovea\/Application%20Notes\/microstructure-resistance.pdf\"> Mikrostruktura przy u\u017cyciu testu zarysowa\u0144<\/a><\/p>","protected":false},"excerpt":{"rendered":"<p>In this application, the Nanovea Mechanical Tester in its nano scratch testing mode is used to measure the load required to cause failure to a microstructure. We must simulate the process of scratching in a controlled and monitored manner to observe scratch resistance. A 10\u03bcm diamond tipped stylus is used at a progressive load ranging [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":1241,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_exactmetrics_skip_tracking":false,"_exactmetrics_sitenote_active":false,"_exactmetrics_sitenote_note":"","_exactmetrics_sitenote_category":0,"footnotes":""},"categories":[7],"tags":[182],"class_list":["post-1240","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-application-notes","tag-scratch-resistance"],"_links":{"self":[{"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/posts\/1240","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/comments?post=1240"}],"version-history":[{"count":3,"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/posts\/1240\/revisions"}],"predecessor-version":[{"id":1799,"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/posts\/1240\/revisions\/1799"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/media\/1241"}],"wp:attachment":[{"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/media?parent=1240"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/categories?post=1240"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/nanovea.com\/pl\/wp-json\/wp\/v2\/tags?post=1240"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}