{"id":3355,"date":"2018-03-29T13:50:56","date_gmt":"2018-03-29T13:50:56","guid":{"rendered":"https:\/\/nanovea.com\/?p=3355"},"modified":"2021-06-22T22:02:31","modified_gmt":"2021-06-22T22:02:31","slug":"mechanical-properties-of-silicon-carbide-wafer-coatings","status":"publish","type":"post","link":"https:\/\/nanovea.com\/es\/mechanical-properties-of-silicon-carbide-wafer-coatings\/","title":{"rendered":"Propiedades mec\u00e1nicas de los recubrimientos de obleas de carburo de silicio"},"content":{"rendered":"<p>Es fundamental comprender las propiedades mec\u00e1nicas de los recubrimientos de las obleas de carburo de silicio. El proceso de fabricaci\u00f3n de dispositivos microelectr\u00f3nicos puede constar de m\u00e1s de 300 pasos diferentes y durar entre seis y ocho semanas. Durante este proceso, el sustrato de la oblea debe ser capaz de soportar las condiciones extremas de la fabricaci\u00f3n, ya que un fallo en cualquier paso supondr\u00eda una p\u00e9rdida de tiempo y dinero. Las pruebas de <a href=\"https:\/\/nanovea.com\/micro-indentation-tester\/\">dureza<\/a>, La adhesi\u00f3n\/resistencia a los rayones y el COF\/\u00edndice de desgaste de la oblea deben cumplir ciertos requisitos para soportar las condiciones impuestas durante el proceso de fabricaci\u00f3n y aplicaci\u00f3n, a fin de garantizar que no se produzcan fallas.<\/p>\n<p><a href=\"http:\/\/nanovea.com\/App-Notes\/NanoindentationofWafer.pdf\">Propiedades mec\u00e1nicas de los recubrimientos de obleas de carburo de silicio<\/a><\/p>","protected":false},"excerpt":{"rendered":"<p>Understanding the mechanical properties of silicon carbide wafer coatings is critical. The fabrication process for microelectronic devices can have over 300 different processing steps and can take anywhere from six to eight weeks. During this process, the wafer substrate must be able to withstand the extreme conditions of manufacturing, since a failure at any step [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":3359,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_exactmetrics_skip_tracking":false,"_exactmetrics_sitenote_active":false,"_exactmetrics_sitenote_note":"","_exactmetrics_sitenote_category":0,"footnotes":""},"categories":[7,348,338,349,337,355,335,345,346],"tags":[307],"class_list":["post-3355","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-application-notes","category-friction-testing-coefficient-of-friction","category-indentation-hardness-elastic","category-laboratory-testing","category-mechanical-testing","category-profilometry-volume-area","category-profilometry-testing","category-scratch-testing-adhesive-failure","category-scratch-testing-cohesive-failure","tag-properties-of-silicon"],"_links":{"self":[{"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/posts\/3355","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/comments?post=3355"}],"version-history":[{"count":1,"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/posts\/3355\/revisions"}],"predecessor-version":[{"id":3356,"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/posts\/3355\/revisions\/3356"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/media\/3359"}],"wp:attachment":[{"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/media?parent=3355"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/categories?post=3355"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/nanovea.com\/es\/wp-json\/wp\/v2\/tags?post=3355"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}