{"id":1052,"date":"2013-09-05T16:28:05","date_gmt":"2013-09-05T16:28:05","guid":{"rendered":"http:\/\/nanovea.com\/?p=1052"},"modified":"2019-07-31T14:45:04","modified_gmt":"2019-07-31T14:45:04","slug":"wafer-array-flatness-measurement-using-3d-profilometry","status":"publish","type":"post","link":"https:\/\/nanovea.com\/de\/wafer-array-flatness-measurement-using-3d-profilometry\/","title":{"rendered":"Ebenheitsmessung eines Wafers mit 3D-Profilometrie"},"content":{"rendered":"<p>In dieser Anwendung wird das Nanovea ST400 <a title=\"profilometer\" href=\"https:\/\/nanovea.com\/profilometers\" target=\"_blank\" rel=\"noopener noreferrer\">Profilometer<\/a> wird verwendet, um den Querschnitt einer Wafer-Anordnung zu messen. Die gemessene Fl\u00e4che wurde nach dem Zufallsprinzip ausgew\u00e4hlt und als gro\u00df genug angenommen, um Annahmen \u00fcber eine viel gr\u00f6\u00dfere Fl\u00e4che treffen zu k\u00f6nnen. Oberfl\u00e4che <a title=\"Ebenheitsmessung\" href=\"https:\/\/nanovea.com\/surface-flatness-measurement\" target=\"_blank\" rel=\"noopener noreferrer\">Ebenheitsmessung<\/a>, Ebenheit und andere Oberfl\u00e4chenparameter werden zur Analyse der Oberfl\u00e4che verwendet.<\/p>\n<p><a href=\"https:\/\/nanovea.com\/wp-content\/themes\/wp-nanovea\/Application%20Notes\/wafer-array-flatness.pdf\"><br \/>\nEbenheitsmessung eines Wafers mit 3D-Profilometrie<\/a><\/p>","protected":false},"excerpt":{"rendered":"<p>In this application the Nanovea ST400 Profilometer is used to measure the section of a wafer array. The area measured was selected at random, and assumed large enough in that it could be extrapolated to make assumptions about a much larger surface. Surface flatness measurement, planarity &amp; other surface parameters are used to analyze the [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":1053,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_exactmetrics_skip_tracking":false,"_exactmetrics_sitenote_active":false,"_exactmetrics_sitenote_note":"","_exactmetrics_sitenote_category":0,"footnotes":""},"categories":[7,354],"tags":[153],"class_list":["post-1052","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-application-notes","category-profilometry-flatness-warpage","tag-flatness-measurement"],"_links":{"self":[{"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/posts\/1052","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/comments?post=1052"}],"version-history":[{"count":4,"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/posts\/1052\/revisions"}],"predecessor-version":[{"id":6629,"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/posts\/1052\/revisions\/6629"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/media\/1053"}],"wp:attachment":[{"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/media?parent=1052"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/categories?post=1052"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/nanovea.com\/de\/wp-json\/wp\/v2\/tags?post=1052"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}